Gatis Mozoļevskis from ISSP UL Laboratory of Prototyping of Electronic & Photonic Devices visited University of Tartu and attended seminar about operation and user experience of atomic layer deposition equipment on May 23.
New atomic layer deposition reactor has been built and exploited in the Laboratory of Thin Film Technology at the end of the year 2008. The reactor was constructed and assembled by Jaan Aarik and Raul Rammula, in co-operation with companies AnkoTata & Co, and Evikon MCI. Compared to the earlier used apparatus, the new reactor allows deposition of nanolaminated solid layers as well as films of mixed chemical composition. The reactor is equipped with a real time growth monitoring system. The apparatus is portative, enabling its linkage to the surface analysis station.